Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-08-07
1998-11-17
Turner, Archene
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041921, 20419226, 20419222, 20419225, 65 601, 65 602, 65 604, 65 608, 65 63, 427162, 427164, 427165, 4273722, 4273762, 4273766, 427380, 4273835, 4273977, 4273831, 4274197, C23C 1400, C23C 1423
Patent
active
058371087
ABSTRACT:
A sputter-coated layer system including a non-nitrided and non-oxidized nickel or nickel alloy layer located between two layers of Si.sub.3 N.sub.4 of the requisite thicknesses and used for architectural and automotive glass substrates so as to be heat treatable and have .DELTA.E characteristics sufficiently low to render the products matchable as between heat treated and non-heat treated products having the same coating thereon.
REFERENCES:
patent: 4450201 (1984-05-01), Brill et al.
patent: 5085926 (1992-02-01), Iida et al.
patent: 5411794 (1995-05-01), Kawaguchi et al.
patent: 5543229 (1996-08-01), Ohsaki et al.
Hartig Klaus W.
Larson Steven L.
Lingle Philip J.
Guardian Industries Corp.
Turner Archene
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