Photopolymerizable compositions containing inhibitor compounds h

Details Photopolymerizable compositions containing inhibitor compounds h Photopolymerizable compositions containing inhibitor compounds h

Filed on

1980-04-02

Date issued

1981-04-28

Examiner

Brammer, Jack P.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Radiation sensitive composition or product or process of making

Other Related Categories

430282, 430285, 430288, 430917, 20415918, 20415924, G03C 168

Type

Patent

Status

active

Patent number

042647100

Description

ABSTRACT:
A photopolymerizable composition is described comprising (1) an addition-polymerizable compound having at least one ethylenically unsaturated double bond, (2) a photopolymerization initiator, and (3) a post-exposure polymerization inhibitor compound including a thioureylene group, such as a compound selected from the group consisting of thiourea and thiourea derivatives represented by the general formula (I), thiosemicarbazide and thiosemicarbazide derivatives represented by the general formula (II), and thiosemicarbazone derivatives represented by the general formula (III): ##STR1## wherein: R.sup.1 and R.sup.2, which may be the same or different each represents a hydrogen atom, an alkyl group having from 1 to 6 carbon atoms, a substituted alkyl group having from 1 to 6 carbon atoms, a phenyl group, a naphthyl group, a substituted phenyl group or a monovalent group derived from an O-, S- or N-containing 5- or 6-member heterocyclic nucleus,

REFERENCES:
patent: 3864133 (1975-02-01), Higamatsu et al.
patent: 4050942 (1977-09-01), Nacci

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