Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-02-21
1999-12-14
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427577, 4272555, 4272557, 4272497, 427128, 427131, 427906, 156643, H05H 124, C23C 1650
Patent
active
060014318
ABSTRACT:
A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like carbon film, and depositing the film on a substrate being moved through said plasma region. Also claimed is an apparatus for fabricating a magnetic recording medium by sequentially and continuously forming a magnetic layer and a diamond-like carbon film on a polymer substrate material, which comprises at least a first vacuum vessel for forming the magnetic layer of the magnetic recording medium and a second vacuum vessel for forming the diamond-like carbon film, provided that the pressure difference between the operation pressures for the first vessel and the second vessel is set in the range of from 10.sup.-2 to 10.sup.-5 Torr.
REFERENCES:
patent: 4534816 (1985-08-01), Chen et al.
patent: 4578559 (1986-03-01), Hijikata et al.
patent: 4663828 (1987-05-01), Hanak
patent: 4755426 (1988-07-01), Kokai et al.
patent: 4910041 (1990-03-01), Yanagihara et al.
patent: 4920917 (1990-05-01), Nakatani et al.
patent: 4991542 (1991-02-01), Kohmura et al.
patent: 5013583 (1991-05-01), Yamaura et al.
patent: 5022979 (1991-06-01), Hijikata et al.
patent: 5102523 (1992-04-01), Beisswenger et al.
patent: 5104685 (1992-04-01), Takahashi et al.
patent: 5203924 (1993-04-01), Mitani et al.
patent: 5217761 (1993-06-01), Okada et al.
patent: 5266116 (1993-11-01), Fujioka et al.
patent: 5294292 (1994-03-01), Yamashita et al.
patent: 5302424 (1994-04-01), Murai et al.
patent: 5336326 (1994-08-01), Karner et al.
patent: 5340621 (1994-08-01), Matsumoto et al.
patent: 5413673 (1995-05-01), Fujimoto
patent: 5449410 (1995-09-01), Chang et al.
Wolf, Silicon Processing for the VLSI Era, vol. 1, Lattice Press, 1986, pp. 172-173, 544, 570-571. No Month Data.
Hayashi Shigenori
Itoh Kenji
Costellia Jeffrey L.
Ferguson Jr. Gerald J.
King Roy V.
Semiconductor Energy Laboratory Co,. Ltd.
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