Optical arrangement for exposure apparatus

Details Optical arrangement for exposure apparatus Optical arrangement for exposure apparatus

1992-10-02

1995-02-28

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 378 85, G21K 504

Patent

active

053944518

ABSTRACT:
An optical arrangement includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.

REFERENCES:
patent: 4028547 (1977-06-01), Eisenberger
patent: 4788698 (1988-11-01), Kimura et al.
patent: 5031199 (1991-07-01), Cole, III et al.
patent: 5123036 (1992-06-01), Uno et al.
patent: 5125014 (1992-06-01), Watanabe et al.
patent: 5150151 (1992-09-01), Mochizuki et al.

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