Radiation-sensitive resin composition

Details Radiation-sensitive resin composition Radiation-sensitive resin composition

1994-06-06

1995-02-28

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430325, 430914, 430921, 430925, 430942, 522 31, 522 59, 522148, G03F 7038

Patent

active

053936418

ABSTRACT:
A novel radiation-sensitive resin composition having high sensitivity and high O.sub.2 -RIE resistance is otained by blending 0.5 g of poly(di-t-butoxysiloxane), 50 mg of triphenylsulfonium trifluoromethanesulfonate as acid-producing agent, and 4 ml of 2-methoxyethyl acetate as solvent.

REFERENCES:
patent: 5120629 (1992-06-01), Bauer et al.
patent: 5135838 (1992-08-01), Houlihan et al.
PTO-English-Translation of Japanese Patent 60-186570 Pub Data Sep. 24, 1985.
"Complex Triarylsulfonium Salt Photoinitiators. I. The Identification Characterization, and Synthesis of a New Class . . . " J. V. Crivello et al., Journal of Polymer Sci.: Polymer Chemistry Edition, vol. 18, 2677-2695 (1980).
"Photoinitiation of Cationic Polymerization. II. Laser Flash Photolysis of Diphenyliodonium Salts", S. Peter Pappas, et al., Journal of Polymer Sci.: Polymer Chemistry Ed., vol. 22 69-76 (1984).

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