Photosensitive recording material which can be developed with wa

Details Photosensitive recording material which can be developed with wa Photosensitive recording material which can be developed with wa

1984-06-25

1985-11-19

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430287, 20415914, G03C 168

Patent

active

045542406

ABSTRACT:
A photosensitive recording material for the production of printing plates, relief plates or resist images comprises a photocurable relief-forming layer (RL) which is applied onto a dimensionally stable base and consists of

REFERENCES:
patent: 2929710 (1960-03-01), Martin
patent: 3427161 (1969-02-01), Leopold
patent: 3877939 (1975-04-01), Okai
patent: 4247624 (1981-01-01), Foss
patent: 4272620 (1981-06-01), Ichimura

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