X-ray mask blank and manufacturing method for the same, and manu

Details X-ray mask blank and manufacturing method for the same, and manu X-ray mask blank and manufacturing method for the same, and manu

1997-12-12

1999-12-07

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 430 5, G03F 116

Patent

active

059995904

ABSTRACT:
An X-ray mask blank and a manufacturing method for an X-ray mask make it possible to manufacture an X-ray mask which has an extremely low stress, thus providing an extremely high positional accuracy. In the X-ray mask blank, an X-ray transparent film is formed on a substrate, and an X-ray absorber film is formed on the X-ray transparent film. An etching mask layer composed of a material containing chromium and carbon, and/or nitrogen is provided on the X-ray absorber film.

REFERENCES:
patent: 4530891 (1985-07-01), Nagarekawa et al.
patent: 4720442 (1988-01-01), Shinkai et al.
patent: 5756237 (1998-05-01), Amemiya
patent: 5848120 (1998-12-01), Shoki et al.

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