Photosensitive compositions based on polyphenols and acetals

Details Photosensitive compositions based on polyphenols and acetals Photosensitive compositions based on polyphenols and acetals

1992-02-27

1993-08-24

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430909, 430927, 522 31, 522 46, 522129, 522146, G03C 1492

Patent

active

052387810

ABSTRACT:
Photosensitive compositions comprising

REFERENCES:
patent: 3265708 (1966-08-01), Stiteler
patent: 3779778 (1973-12-01), Smith et al.
patent: 3869292 (1975-03-01), Peters
patent: 4247611 (1981-01-01), Sander et al.
patent: 4640937 (1987-02-01), Hanyuda
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4737426 (1988-04-01), Roth
patent: 4800152 (1989-01-01), Allen et al.
patent: 5079129 (1992-01-01), Roth et al.
PTO-English-language translation of German Patent DE 2,342,068 Apr. 4, 1974.
Polym. Mat. Sci. Eng. 60, (1989), 147-150 and 151-154.
J. Electrochem. Soc., vol. 136, No. 5, May 1989 pp. 1453-1456.
Chem. Abst. 72, 21964u (1970).

Affiliated with

Also associated with

Rating

Photosensitive compositions based on polyphenols and acetals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive compositions based on polyphenols and acetals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive compositions based on polyphenols and acetals will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-827981