Semiconductor processing system with gas curtain

Details Semiconductor processing system with gas curtain Semiconductor processing system with gas curtain

1996-10-11

1999-12-07

Graybill, David

Metal working

Barrier layer or semiconductor device making

414805, 414939, 414941, 438941, 438908, H01L 2168, B65G 4907

Patent

active

059975881

ABSTRACT:
A gas curtain for use with a semiconductor processing system to prevent unwanted gases from entering a processing chamber. The gas curtain includes both upward and downward flows of gas surrounding an isolation valve adjacent a delivery port into the processing chamber. In the valve open position, the downward flows extends between the valve and the delivery port, and the upward flow extends in an opposite direction behind the isolation valve. In the valve closed position, one of the flows extends through a slot in the isolation valve, while the other flow is directed in an opposite direction on the rear side of the isolation valve. In a method of using the gas curtain apparatus, a pick-up wand operating on a Bernoulli principal uses gases which are unwanted in the processing chamber, and just prior to loading wafers into the processing chamber, the gas flow in the Bernoulli wand is switched from a first gas to a second gas. Desirably, the second gas is hydrogen. The Bernoulli wand passes through the gas curtain before entering the processing chamber to remove any fugitive particles, moisture and unwanted gases. An exhaust located proximate to an input/output chamber creates a continuous pressure gradient in the handling chamber toward the input/output chamber further helping to prevent unwanted gases from entering the processing chamber.

REFERENCES:
patent: 3314393 (1967-04-01), Haneta
patent: 3635757 (1972-01-01), Harris
patent: 3659551 (1972-05-01), McKinstry
patent: 3660179 (1972-05-01), Desmond et al.
patent: 3672948 (1972-06-01), Foehring et al.
patent: 3696779 (1972-10-01), Murai et al.
patent: 3785853 (1974-01-01), Kirkman et al.
patent: 3893876 (1975-07-01), Akai et al.
patent: 3925118 (1975-12-01), Hollan
patent: 4048955 (1977-09-01), Anderson
patent: 4116733 (1978-09-01), Olsen et al.
patent: 4438723 (1984-03-01), Cannella et al.
patent: 4438724 (1984-03-01), Doehler et al.
patent: 4450786 (1984-05-01), Doehler et al.
patent: 4459104 (1984-07-01), Wollmann
patent: 4480585 (1984-11-01), Gattuso
patent: 4500407 (1985-02-01), Boys et al.
patent: 4537795 (1985-08-01), Nath et al.
patent: 4543059 (1985-09-01), Whang et al.
patent: 4682565 (1987-07-01), Carrico
patent: 4803948 (1989-02-01), Nakagawa et al.
patent: 4821674 (1989-04-01), Deboer
patent: 4823480 (1989-04-01), Komatsuzaki
patent: 4824309 (1989-04-01), Kakehi et al.
patent: 4836138 (1989-06-01), Robinson
patent: 4949669 (1990-08-01), Ishii et al.
patent: 4950156 (1990-08-01), Philipossian
patent: 5064367 (1991-11-01), Philipossian
patent: 5080549 (1992-01-01), Goodwin
patent: 5105762 (1992-04-01), Wilkinson
patent: 5147168 (1992-09-01), Suwa et al.
patent: 5156521 (1992-10-01), Crabb
patent: 5259883 (1993-11-01), Yamabe et al.
patent: 5266116 (1993-11-01), Fujioka et al.
patent: 5312490 (1994-05-01), Wilkinson
patent: 5316794 (1994-05-01), Carlson et al.
patent: 5344542 (1994-09-01), Maher et al.
patent: 5352293 (1994-10-01), Yang et al.
patent: 5363872 (1994-11-01), Lorimer
patent: 5370736 (1994-12-01), Roy et al.
patent: 5374313 (1994-12-01), Doehler
patent: 5382127 (1995-01-01), Garric et al.
patent: 5388944 (1995-02-01), Takanabe et al.
patent: 5388945 (1995-02-01), Garric et al.
patent: 5390785 (1995-02-01), Garric et al.
patent: 5411358 (1995-05-01), Garric et al.
patent: 5411593 (1995-05-01), Carlson et al.
patent: 5425812 (1995-06-01), Tsutahara et al.

Affiliated with

Also associated with

Rating

Semiconductor processing system with gas curtain does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor processing system with gas curtain, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor processing system with gas curtain will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-819033