Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-11-14
1999-03-16
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302801, 430330, 522 63, 522149, 522129, 522113, G03F 7038, G03F 7032
Patent
active
058828435
ABSTRACT:
A photosensitive resin composition is disclosed.
The photosensitive resin composition is characterized by containing (a) a reaction product of a polymer having a specific segment with (3,4-epoxycylohexyl)-methyl methacrylate, (b) a polymerization initiator allowing the initiation of the polymerization of said reaction product when irradiated with an actinic radiation, and (c) a solvent. Preferably, the composition further contains (d) a thermal crosslinker, a compound having a polymerizable unsaturated bond and/or a pigment in addition to the above ingredients.
According to the present invention, there is provided the photosensitive resin composition which has such excellent characteristics that it has high sensitivity, it does not require a heat treatment between exposure-development steps, it causes little change of sensitivity and pattern shape with time from the exposure to the development, it has high heat resistance, it permits the use of an aqueous system in the development step and it has good storage stability.
REFERENCES:
patent: 3987037 (1976-10-01), Bonham et al.
patent: 3989610 (1976-11-01), Tsukada et al.
patent: 4189323 (1980-02-01), Buhr
patent: 5002977 (1991-03-01), Seko et al.
Kudo Takanori
Nagao Kazuya
Nanjo Yuki
Nozaki Yuko
Hamilton Cynthia
Hoechst Japan Limited
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