Method of producing a primary diffraction grating

Details Method of producing a primary diffraction grating Method of producing a primary diffraction grating

1989-10-16

1991-01-29

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156654, 1566611, B44C 122, C03C 1500, C03C 2506

Patent

active

049884042

ABSTRACT:
A method of producing a primary diffraction grating includes depositing a resist pattern for producing a secondary diffraction grating on a substrate and thereafter etching the substrate using the resist as a mask, thereby producing a secondary diffraction grating, depositing a second mask material on the substrate and on the remaining resist, and subsequently removing the resist, and etching the exposed surface of the substrate using the second mask material as a mask, thereby to produce a primary diffraction grating. Therefore, there arises no waviness in the pattern end of the second resist mask pattern and a high quality primary diffraction grating can be produced.

REFERENCES:
S. M. Sze, Semiconductor Devices, Physics and Technology, 9.2.2, Silicon Nitride, 1985, pp. 360-362.
Hirata et al, "AlGaAs/GaAs DFB Lasers . . . Grating", 18P-ZR-14, p. 744.

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