Radiation-sensitive mixture and recording material based on olig

Details Radiation-sensitive mixture and recording material based on olig Radiation-sensitive mixture and recording material based on olig

1991-01-15

1993-05-18

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430306, 430309, 430315, 430328, 523106, G03F 7033

Patent

active

052120490

ABSTRACT:
A radiation-sensitive mixture is disclosed which contains as essential constituents

REFERENCES:
patent: 3628963 (1971-12-01), Akamatsu et al.
patent: 4197130 (1980-04-01), Nakamura et al.
patent: 4423135 (1983-12-01), Chen et al.
patent: 4430417 (1984-02-01), Heinz et al.
patent: 4638019 (1987-01-01), Van Gentzkow et al.
Barzynski et al., "Photopolymerisation", Chemiker-Zeitung, 1972, vol. 96, pp. 545-551.
Otsu et al., "Polymers from 1,2-Disubstituted Ethylenic Monomers, 2.sup.a) Homopolymers from Dialkyl Fumarates by Radical Initiator", Makromol. Chem., Rapid Commun., 1981, vol. 2, pp. 725-728.
Otsu, "Reactivities of Acrylic Monomers and Their Radicals in Radical Polymerization", Makromol. Chem., Macromol. Symp., 1987, vol. 10/11, pp. 235-254.
Roffey, "Photopolymerization of Surface Coatings", Wiley-Interscience, 1982, pp. 137-208.

Affiliated with

Also associated with

Rating

Radiation-sensitive mixture and recording material based on olig does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive mixture and recording material based on olig, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture and recording material based on olig will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-803594