Position detecting method and apparatus

Optics: measuring and testing – By polarized light examination – With light attenuation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356401, 250548, G01B 1114, G01N 2186

Patent

active

053194446

ABSTRACT:
A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4265542 (1981-05-01), Snow
patent: 4326805 (1982-04-01), Feldman et al.
patent: 4360273 (1982-11-01), Thaxter
patent: 4498762 (1985-02-01), Uehara et al.
patent: 4545683 (1985-10-01), Markle
patent: 4600309 (1986-07-01), Fay
patent: 4662753 (1987-05-01), Yabu
patent: 4694186 (1987-09-01), Onoda et al.
patent: 4728193 (1988-03-01), Bartelt et al.
patent: 4769523 (1988-09-01), Tanimoto et al.
patent: 4835078 (1989-05-01), Harvey et al.
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5162656 (1992-11-01), Matsugu et al.
H. Chau, "Properties of Two Overlapping Zone Plates of Different Focal Lengths," Journ. of the Opt. Soc. of America, Feb. 1970, vol. 60, No. 2 pp. 255-259.
Chau, "Moire Pattern Resulting From Superposition of Two Zone Plates," Applied Optics, Aug. 1969, vol. 8, No. 8, pp. 1707-1712.
"A Dual Grating Alignment Technique for X-Ray Lithography", J. Vac. Sci. Technol. B1 (4), Kinoshita, et al., Oct.-Dec. 1983, pp. 1276-1279.
"Opt.-Heterodyne Detect. of Mask-to-Wafer Displac. for Fine Align.", Japan. Journal of Appl. Physics, Itoh, et al., vol. 25, No. 8, Aug. 1986, L684-L686.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Position detecting method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Position detecting method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Position detecting method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-797124

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.