Radiation-sensitive sulfonic acid esters and their use

Details Radiation-sensitive sulfonic acid esters and their use Radiation-sensitive sulfonic acid esters and their use

1992-06-09

1994-03-29

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430910, 430919, 430922, 522 50, 522 52, 544180, G03C 171, G03C 176

Patent

active

052983641

ABSTRACT:
Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.

REFERENCES:
patent: 3692560 (1972-09-01), Rosenkranz et al.
patent: 4619998 (1986-10-01), Buhr
patent: 4696888 (1987-09-01), Buhr
patent: 4820607 (1989-04-01), Aoai
patent: 4840867 (1989-06-01), Elsaesser et al.
F. M. Houlihan, et al., "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE vol. 920, 1988, pp. 67-73.
J. V. Crivello, "Possibilities for Photoimaging Using Onium Salts", Polymer Engineering and Science, vol. 23, No. 17, Dec. 1983, pp. 953-956.
C. G. Wilson, "Organic Resist Materials-Theory and Chemistry", Introduction to Microlithography ACS Symp. Ser. 219 1983, pp. 88-159.

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