Semiconductor device having field shield element isolating struc

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257296, 257488, 257508, H01L 2976

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active

055214193

ABSTRACT:
A field shield isolating structure forms a structure for isolating elements of a semiconductor device. The field shield isolating structure includes a field shield gate insulating film and field shield electrode formed on the semiconductor substrate in separate processes to constitute a quasi-MOS transistor using impurity regions of adjacent MOS transistors. The film thickness of the field shield gate insulating film is set arbitrarily, the threshold voltage of the quasi-MOS transistor is set high, and then elements are insulated and isolated, so that the transistor is operated in the off state. The upper surface of the field shield electrode is also covered with the upper insulating film. The thicknesses of the upper insulating film and of the field shield gate insulating film is adjusted to have such values that prevent turning ON of the MOS transistor by the capacitance divided voltage. The voltage may be applied from upper conductive layers such as word lines formed above the upper insulating film.

REFERENCES:
patent: 4561170 (1985-12-01), Doering et al.
patent: 4825278 (1989-04-01), Hillenius et al.
patent: 4900693 (1990-02-01), Manning
patent: 4954871 (1990-09-01), Mizutani et al.
patent: 4975753 (1990-12-01), Ema
patent: 4994893 (1991-02-01), Ozaki et al.
patent: 4998161 (1991-03-01), Kimura et al.
patent: 5014099 (1991-05-01), McElroy
patent: 5016069 (1991-05-01), Bergemont
patent: 5067000 (1991-11-01), Eimori et al.
patent: 5164803 (1992-11-01), Ozaki et al.
patent: 5181094 (1993-01-01), Eimori et al.
patent: 5225704 (1993-07-01), Wakamiya et al.
"A High-Performance Directly Insertable Self-Aligned Ultra-Radiation-Hard and Enhanced Isolation Field-Oxide Technology for Gigahertz Si-CMOS VLSI" Lalita Machanda et al., published in IEEE Electron Device Letters, vol. 10, No. 1, p. 17, Jan. 1989.
Lin et al., "Shielded Silicon Gate Complementary MOS Integrated Circuit," IEEE Transactions on Electron Devices, vol. 19, No. 11, Nov. 1972, pp. 1199-1206.

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