Photomask material

Details Photomask material Photomask material

1975-09-08

1980-12-30

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430273, 430276, G03C 174

Patent

active

042424380

ABSTRACT:
A photomask material which comprises a transparent support having a transparent electroconductive layer thereon, the transparent electroconductive layer having thereon a transparent porous aluminum oxide layer formed by anodic oxidation, the aluminum oxide layer containing over the entire layer a uniform distribution of a number of fine pores having a light-sensitive silver halide therein.

REFERENCES:
patent: 3280734 (1966-10-01), Fromson
patent: 3615553 (1971-10-01), Wainer
patent: 3702581 (1972-11-01), Speakman
patent: 3776734 (1973-12-01), Kumasaka
patent: 3808900 (1974-04-01), Magnota et al.
patent: 3811894 (1974-05-01), Yonezawa et al.
patent: 3874878 (1975-04-01), Rasch
patent: 3874879 (1975-04-01), Rasch
patent: 3914126 (1975-10-01), Pinsler
patent: 3961962 (1976-06-01), Sato

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