Electron beam device

Details Electron beam device Electron beam device

1990-05-30

1991-06-11

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250310, H01J 3714

Patent

active

050234579

ABSTRACT:
An unipolar magnetic field type objective lens used as an objective lens of an electron beam device. By properly adjusting the shape and strength of the objective lens, not only the aberration coefficients of the objective lens are reduced but also the secondary electrons emitted from a sample are efficiently detected to thereby allow semiconductor wafers of large diameter to be observed at a low acceleration voltage, a large angle of inclination, and with a high resolution.

REFERENCES:
patent: 3707628 (1972-12-01), Bassett et al.
patent: 3870891 (1975-03-01), Mulvey
patent: 4882486 (1989-11-01), Kruit
patent: 4961003 (1990-10-01), Yonezawa

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