Process for preparing of semiconductor device and pattern-formin

Details Process for preparing of semiconductor device and pattern-formin Process for preparing of semiconductor device and pattern-formin

1990-03-02

1992-02-11

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430326, G03C 172, G03F 710

Patent

active

050875515

ABSTRACT:
A process for the preparation of a semiconductor device and a pattern-forming coating solution used for this process are disclosed. In this process, a coating solution formed by dissolving an .alpha.-methylstyrene/methyl .alpha.-chloroacrylate copolymer as a specific positive resist material in a specific solvent is coated on a layer to be etched, which is formed on a semiconductor substrate. In this process, penetration between the substrate and the resist of the resist into the clayer to be etched, and a formation of cracks in the resist after the etching, are prevented.

REFERENCES:
patent: 4535054 (1955-08-01), Brault et al.
IBM Technical Disclosure Bulletin, vol. 23, No. 33, Aug. 1980, New York U.S. p. 991 Moreau V. M. & Moyer W. A.: "Coating Solvent for Resist Film" *the whole document*.

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