Method for producing a controlled radial path of resistance in a

Details Method for producing a controlled radial path of resistance in a Method for producing a controlled radial path of resistance in a

1974-04-12

1976-08-24

Ozaki, G.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

75 65ZM, 148 15, 252 623E, H01L 742

Patent

active

039765369

ABSTRACT:
A method and apparatus for controlling a radial path of resistance in a semiconductor monocrystalline rod produced by a crucible-free zone melting whereby the material flow path and heat distribution in the melt zone is controlled by a guided stream of protective gas.

REFERENCES:
patent: 2907642 (1959-10-01), Rummel
patent: 3002824 (1961-10-01), Francois
patent: 3030194 (1962-04-01), Emeis
patent: 3141848 (1964-07-01), Enk et al.
patent: 3232745 (1966-02-01), Rummel et al.

Affiliated with

Also associated with

Rating

Method for producing a controlled radial path of resistance in a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing a controlled radial path of resistance in a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a controlled radial path of resistance in a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-776678