Positive-working chemical-sensitization photoresist composition

Details Positive-working chemical-sensitization photoresist composition Positive-working chemical-sensitization photoresist composition

1998-10-28

1999-10-26

Higel, Floyd D.

Organic compounds -- part of the class 532-570 series

Organic compounds

Nitriles

430325, 430328, 430330, 430332, 430334, C07C25500

Patent

active

059731877

ABSTRACT:
Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices. The photoresist composition is characterized by a unique acid-generating agent capable of releasing an acid by the pattern-wise exposure of the resist layer to actinic rays so as to increase or decrease the solubility of the resist layer in an aqueous alkaline developer solution. The acid-generating agent proposed is a novel cyano group-containing oxime sulfonate di- or triester compound represented by the general formula

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