Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1979-06-25
1982-05-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430149, 430309, 430493, G03C 524, G03F 700
Patent
active
043294227
ABSTRACT:
A desensitizing solution and process for using the solution are disclosed to desensitize a diazo photosensitive printing plate after development. The solution comprises a water soluble desensitizing agent capable of reacting with any residual photosensitive diazo on the developed plate to render the diazo incapable of forming an oleophilic substance and a filming agent selected from water soluble aliphatic polyols have less than eight carbon units, the acid derived monoesters of these polyols, and the alkali metal salts of the monoesters.
REFERENCES:
patent: 2354979 (1944-08-01), Almy
patent: 2547632 (1951-01-01), Nadeau et al.
patent: 2772972 (1956-12-01), Herrick et al.
patent: 2780168 (1957-02-01), Nichols
patent: 3257941 (1966-06-01), Wolfson et al.
patent: 3289577 (1973-07-01), Rauner
patent: 3398002 (1968-08-01), Beedurnet
patent: 3501522 (1970-03-01), Farah et al.
patent: 3592640 (1971-07-01), Van Engeland
patent: 3595653 (1971-07-01), Steppan et al.
patent: 3655387 (1972-04-01), Collet et al.
patent: 3669660 (1972-06-01), Golda
patent: 3696746 (1972-10-01), Harper
patent: 3738850 (1973-06-01), Radell et al.
patent: 3745028 (1966-01-01), Rauner
patent: 3829319 (1974-08-01), Suzuki et al.
patent: 3844994 (1974-10-01), Vijayendran
patent: 3891438 (1975-06-01), Katz et al.
patent: 3891439 (1975-06-01), Katz et al.
patent: 4013008 (1977-03-01), Brown
patent: 4022624 (1977-05-01), Miyamoto et al.
Bowers Jr. Charles L.
Napp Systems (USA) Inc.
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