Process for forming a lead film

Details Process for forming a lead film Process for forming a lead film

1981-03-27

1983-07-19

Morgenstern, Norman

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG85, 156DIG103, 156DIG102, 427 38, 427 42, 427 451, 427 62, 427 99, 427250, 427252, C30B 2308

Patent

active

043942105

ABSTRACT:
There is disclosed a process for forming a lead film by a cluster ion beam deposition which includes the step of impinging ionized and non-ionized neutral clusters having 100 to 2,000 atoms of vapor of lead loosely coupled by Van der Walls force upon a substrate within a vacuum chamber which is kept at about 10.sup.-2 Torr or less thereby forming the lead film thereon.

REFERENCES:
patent: 3816173 (1974-06-01), Eldridge et al.
patent: 4091138 (1978-05-01), Takagi et al.
patent: 4098919 (1978-07-01), Morimoto et al.
patent: 4152478 (1979-05-01), Takagi
patent: 4227961 (1980-10-01), Takagi
IBM J. Res. Develop., vol. 24, No. 2, "Fabrication Process for Josephson Integrated Circuits", (Mar. 1980).

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