Substrate heat treatment table apparatus

Details Substrate heat treatment table apparatus Substrate heat treatment table apparatus

1995-10-25

1998-10-06

Graybill, David

Metal working

Barrier layer or semiconductor device making

25049222, 118725, H01L 2168

Patent

active

058171568

ABSTRACT:
A substrate treatment apparatus according to an aspect of the invention includes a table for placing thereon an object to be treated, heating means for heating the object with the table interposed therebetween, and a plurality of support members which project from the table for supporting the object with a space interposed between the object and the table. The height of each of the support members can be varied in accordance with a surface temperature distribution of the object during treatment. A substrate treatment apparatus according to another aspect of the invention includes a table for placing thereon an object to be treated, and heating means for heating the object with the table interposed therebetween. The table has a surface thereof divided into regions of different heat radiation states in accordance with a surface temperature distribution of the object during treatment of the object.

REFERENCES:
patent: 5201653 (1993-04-01), Hasegawa et al.
patent: 5680502 (1997-10-01), Kim
patent: 5702264 (1997-12-01), Liao et al.

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