Ion beam focuser for an ion implanter analyzer

Details Ion beam focuser for an ion implanter analyzer Ion beam focuser for an ion implanter analyzer

Filed on

1998-02-13

Date issued

2000-03-21

Examiner

Anderson, Bruce C.

Patent Class

Radiant energy

SubClass

Irradiation of objects or material

SubSubClass

Irradiation of semiconductor devices

Other Related Categories

250398, 250423R, H01J 3730

Type

Patent

Status

active

Patent number

060405821

Description

ABSTRACT:
A focusing guide for focusing an ion beam passing through the chamber of an ion analyzer is provided. A controllable electric of magnetic field is generated around the focusing guide to direct selected ions through the chamber outlet without significantly reducing ion beam current intensity. The focused ion beam reduces collisions of ions with the chamber and also reduces secondary electron generation which can weaken ion beam intensity and increase ion implantation processing time.

REFERENCES:
patent: 3585397 (1971-06-01), Brewer
patent: 4804852 (1989-02-01), Rose et al.
patent: 4914305 (1990-04-01), Benveniste et al.
patent: 5132545 (1992-07-01), Shono et al.
patent: 5350924 (1994-09-01), Stengl et al.
patent: 5572022 (1996-11-01), Schwartz et al.
patent: 5850084 (1998-12-01), Holkeboer

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