Projection exposure apparatus and projection exposure method

Details Projection exposure apparatus and projection exposure method Projection exposure apparatus and projection exposure method

1998-08-10

1999-09-28

Moses, Richard

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 355 71, G03B 2742, G03B 2754, G03B 2772

Patent

active

059597216

ABSTRACT:
A projection exposure apparatus for exposing a photosensitive substrate with a pattern on a circular mask by projection through a projection optical system. The apparatus includes a prealignment stage for previously correcting an error of the circular mask in its rotational direction, and a transport arm and a rotatable arm for transporting the circular mask from the prealignment stage to a mask stage. The prealignment stage includes an optical detecting system for detecting the rotational error of the circular mask from a predetermined orientation on the prealignment stage, a rotatable stage for rotating the circular mask on the prealignment stage, and a unit for controlling the rotatable stage on the basis of the rotational error so that the circular mask has the predetermined orientation. Orientational adjustment can be previously performed before importing the circular mask to the mask stage of the projection exposure apparatus.

REFERENCES:
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patent: 4461567 (1984-07-01), Mayer
patent: 4655584 (1987-04-01), Tanaka et al.
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patent: 5197089 (1993-03-01), Baker
patent: 5238354 (1993-08-01), Volovich
patent: 5258823 (1993-11-01), Akamatsu
patent: 5464715 (1995-11-01), Nishi et al.
patent: 5646413 (1997-07-01), Nishi

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