Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1996-04-16
1999-09-28
Crane, Sara
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257306, H01L 27108
Patent
active
059593199
ABSTRACT:
A semiconductor memory device has word line conductor films, bit line conductor films transverse to the word line conductor films and memory cells provided at intersections between the word line conductor films and bit line conductor films. Each memory cell has a transistor structure formed at a surface portion of a semiconductor substrate and a capacitor structure formed over the semiconductor substrate. The word line conductor films are formed at a level lower than the capacitor structures of the memory cells to improve the resolution of patterns for the semiconductor memory device.
REFERENCES:
patent: 4962322 (1990-10-01), Chapman
patent: 5151772 (1992-09-01), Takahashi et al.
patent: 5247196 (1993-09-01), Kimura
patent: 5274258 (1993-12-01), Ahn
patent: 5412237 (1995-05-01), Komori et al.
patent: 5572053 (1996-11-01), Ema
patent: 5604365 (1997-02-01), Kajigaya et al.
Japanese Journal, "Nikkei Micro-Devices", Aug. 1994, pp. 32-37, Nikkei Business Publications, Inc.
Crane Sara
Nippon Steel Corporation
LandOfFree
Semiconductor memory device having word line conductors provided does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor memory device having word line conductors provided, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor memory device having word line conductors provided will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-706369