Process for synthesizing diamond in a vapor phase

Details Process for synthesizing diamond in a vapor phase Process for synthesizing diamond in a vapor phase

1994-07-22

1997-04-29

Straub, Gary P.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427249, 423446, B01J 306

Patent

active

056247192

ABSTRACT:
A method for synthesizing diamond by chemical vapor deposition (CVD) is described. The method produces diamond of high purity and high crystallizability having various uses at low cost and at high speed. In a first method, a mixture of oxygen gas and a carbon-containing compound gas, and optionally an inert gas, is introduced into a reaction vessel. In a second method, a mixture containing at least one of fluorine gas, chlorine gas, a nitrogen oxide gas, sulfur dioxide, an aforementioned mixture of oxygen gas and a carbon-containing compound gas, or a mixture thereof with an inert gas is introduced into the reaction vessel. A plasma is generated by use of an electromagnetic field, thereby producing diamond on a base material placed in the vessel.

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