Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1985-10-23
1987-05-26
Chapman, Terryence
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
204298, 156345, 156643, C23F 100, C23C 1400
Patent
active
046683666
ABSTRACT:
The present invention is directed to method and apparatus for figuring a surface by plasma assisted chemical transport by means of mounting the surface to be processed on at least one electrode of an R.F. driven reactor having two parallel plate electrodes; passing reactive gas through the reactor to establish gas discharge by the R.F. power; while controlling the ion energies of the reactive gas; and while controlling the removal rate of different areas of the surface by using a substantially smaller surface area electrode than said surface area so that varying the amount of time the small surface area electrode spends at each region shapes the surface. According to one aspect of the invention optical measurement of said surface is affected in quasi real time.
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Chapman Terryence
Grimes Edwin T.
Masselle Francis L.
Murphy Thomas P.
The Perkin-Elmer Corporation
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