Photoresist compositions containing t-substituted organomethyl v

Details Photoresist compositions containing t-substituted organomethyl v Photoresist compositions containing t-substituted organomethyl v

1985-09-27

1986-07-29

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430280, 430281, 430325, 430326, 522150, 522152, 522154, 522155, G03C 176

Patent

active

046031014

ABSTRACT:
t-Butylvinylaryl ethers are provided which can be used to make t-butyl substituted polyaryl ethers and photoresist compositions. The photoresist compositions can be made by combining the t-butylpolyaryl ethers with aromatic onium salts.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.

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