Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1985-05-06
1986-07-29
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156643, 156646, 156345, 204192E, 204298, H01L 21306, B44C 122, C03C 1500, B29C 1708
Patent
active
046029818
ABSTRACT:
Plasma potential monitoring during a plasma etching process is accomplished by measuring the RF voltage at an electrode of, for example, a high pressure, high plasma density, symmetric single wafer reactor. The plasma potential is indicative of the plasma density, which has a high sensitivity to secondary electron emission from a wafer surface and yields both process etching endpoint and diagnostic information for a wide variety of processes and process conditions.
REFERENCES:
patent: 4207137 (1980-06-01), Tretola
patent: 4358338 (1982-11-01), Downey et al.
patent: 4362596 (1982-12-01), Desilets et al.
Chen Lee
Mathad Gangadhara S.
International Business Machines - Corporation
Lashmit Douglas A.
Powell William A.
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