Gas recovery unit

Coating apparatus – Gas or vapor deposition

Patent

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Details

62 482, 62614, 62616, C23C 1600

Patent

active

059581387

ABSTRACT:
Provided is a gas recovery unit which is more efficient in its recovery and less expensive to run. The gas recovery unit comprises a CVD device, an exhaust gas recovery part and an exhaust gas purification part. The exhaust gas recovery part is constructed so as to have an inert gas reservoir part capable of accommodating liquid nitrogen, to have an exhaust gas supply part for supplying an exhaust gas to said inert gas reservoir part so that it can be brought in gasliquid contact with the liquid nitrogen, and to have a recovered and liquefied gas discharge part for discharging the recovered and liquefied gas which has been liquefied in the inert gas reservoir part. The exhaust gas purification part is constructed so as to have a recovered and liquefied gas reception part, an evaporator and a condenser for carrying out a heat exchange between said liquid nitrogen and the recovered and liquefied gas which has been evaporated, and cleaning gas recovery parts, and to have a cooling inert gas discharge part, wherein the cooling inert gas discharge part is connected to the inert gas supply path.

REFERENCES:
patent: 4549889 (1985-10-01), Yamazaki
patent: 5250323 (1993-10-01), Miyazaki
patent: 5426945 (1995-06-01), Menzenski

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