Method of manufacturing a semiconductor device having a reflecti

Details Method of manufacturing a semiconductor device having a reflecti Method of manufacturing a semiconductor device having a reflecti

1995-11-01

1999-04-27

Chang, Ceila

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

257760, 257774, 257915, H01L 2100

Patent

active

058973761

ABSTRACT:
A method of manufacturing a semiconductor device includes forming a reflection reducing film on a film having a high reflectance and forming a photoresist on the first reflection reducing film. When the photoresist is patterned by selectively exposing the photoresist to an exposure light through a photomask by photolithography technology, the photoresist is not exposed by a light reflected by the film having high reflectance, thereby allowing a pattern of the photoresist to be formed which corresponds to the photomask.

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