Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1987-04-24
1989-04-11
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430275, 430276, 430311, 430313, 430316, 430317, 430318, 430523, 430524, 430525, 430950, 437229, G03C 194
Patent
active
048206113
ABSTRACT:
Reflection of incident optical radiation (18) from a highly reflective metal layer (12), such as aluminum or titanium, into a photoresist layer (14) is reduced by interposing a layer of titanium nitride (16) between the metal and photoresist layers. The thickness of the TiN layer depends on the wavelength of the optical radiation used to expose the photoresist and on the optical properties of the underlying metal layer. Reflectance of less than about 2% may be achieved using the TiN layer in conjunction with aluminum and less than about 5% in conjunction with titanium, in accordance with the invention. If left in place after patterning an underlying aluminum layer, the TiN layer also serves to suppress hillock formation in the aluminum layer.
REFERENCES:
patent: 4587138 (1986-05-01), Yam et al.
Harrison et al., "The Use of Anti-Reflection Coatings . . . ", National Semiconductor Corporation, 1983.
Van den Berg, "Antireflective Coatings on Metal Layers for Photolithographic Purposes", Journal of Applied Physics, vol. 50, No. 3, pp. 1212-1214 (Mar. 1979).
Brewer, "The Reduction of the Standing Wave Effect in Positive Photoresists", Journal of Applied Photographic Engineering, vol. 7, No. 6, pp. 184-186 (Dec. 1981).
Martin, "Optical Properties of TiN.sub.x Produced by Reactive Evaporation and Reactive Ion-Beam Sputtering", Vacuum, vol. 32, pp. 359-362 (1982).
Arnold, III William H.
Farnaam Mohammad
Sliwa Jack
Advanced Micro Devices , Inc.
Dees Jos,e G.
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