Ferroelectric semiconductor device, and ferroelectric semiconduc

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

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Details

Other Related Categories

257296, 438 3, 438240, H01L 2978

Type

Patent

Status

active

Patent number

060970472

Description

ABSTRACT:
A ferroelectric semiconductor device (10) and a method of manufacturing the ferroelectric semiconductor device (10). The ferroelectric semiconductor device (10) is manufactured from a substrate (11) that has a layer (14) of ferroelectric material sandwiched between a substrate (13) and a layer (16) of silicon. A gate structure (24) is formed on the layer (16) of silicon. A source region is formed in a portion of the layer (16) of silicon adjacent one side of the gate structure (24) and a drain region is formed in a portion of the layer (16) of silicon adjacent an opposing side of the gate structure (24).

REFERENCES:
patent: 5373176 (1994-12-01), Nakamura
patent: 5466629 (1995-11-01), Mihara et al.
patent: 5478653 (1995-12-01), Guenzer
patent: 5524092 (1996-06-01), Park
patent: 5585300 (1996-12-01), Summerfelt
patent: 5846847 (1998-12-01), Ooms et al.
patent: 5851844 (1998-12-01), Ooms et al.
patent: 5874755 (1999-02-01), Ooms et al.

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