Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent
1995-08-29
2000-08-01
Mullis, Jeffrey C.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
525314, C08F29704
Patent
active
060968281
ABSTRACT:
A block copolymer comprising at least three consecutive conjugated diene/monovinylarene tapered blocks is provided. Other aspects of this invention include a polymerization process for preparing the block copolymer and polymer blends comprising the block copolymer. The block copolymer and polymer blends exhibit excellent optical and mechanical properties.
REFERENCES:
patent: 4089913 (1978-05-01), Tamotsu et al.
patent: 4631314 (1986-12-01), Tung et al.
patent: 4704434 (1987-11-01), Kitchen et al.
patent: 4925899 (1990-05-01), Rendina
patent: 5130377 (1992-07-01), Trepka et al.
patent: 5227419 (1993-07-01), Moczygemba et al.
patent: 5256836 (1993-10-01), Trepka et al.
patent: 5272207 (1993-12-01), Hall et al.
patent: 5290875 (1994-03-01), Moczygemba et al.
patent: 5319033 (1994-06-01), Trepka
patent: 5399628 (1995-03-01), Moczygemba et al.
patent: 5436298 (1995-07-01), Moczygemba
patent: 5438103 (1995-08-01), DePorter
Chemical Abstracts, vol. 104, No. 14, 1986, Abstract No. 111041z, p. 59 (1986).
Derwent Publications Ltd., London, GB; AN 87-159661; XP002016522.
DePorter Craig D.
Moczygemba George A.
Stacy Nathan E.
Mullis Jeffrey C.
Phillips Petroleum Company
LandOfFree
Conjugated diene/monovinylarene block copolymers, methods for pr does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Conjugated diene/monovinylarene block copolymers, methods for pr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Conjugated diene/monovinylarene block copolymers, methods for pr will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-664779