Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-02-23
2000-08-01
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430914, 430921, G03F 7004
Patent
active
060964782
ABSTRACT:
An object of the present invention is to inhibit a size difference possibly caused due to different pattern densities, and at the same time to form a desired resist having fewer irregularities on the side walls thereof, all with respect to a chemically amplified negative type resist. In order to achieve the object, a resist material of the present invention comprises a resin for forming the resist material, a first photo-acid generating agent having a molecular weight of 100-1000 and capable of producing an acid having a diffusion length of 10-30 nm, a second photo-acid generating agent having a molecular weight of 100-1000 and capable of producing an acid having a diffusion length of 30-60 nm. In particular, a mixing ratio for mixing the second photo-acid generating agent into the first photo-acid generating agent is 5-95 mol %, a mixing ratio for mixing a total amount of the first and second photo-acid generating agents into the resin is 1-15 wt %.
REFERENCES:
patent: 5824824 (1998-10-01), Owasa et al.
JP 10223503A, Aug.-1998, Derwent Abstract.
Hashimoto et al. Microelectronic Eng. 41/42, 1998, 363-366.
Ashton Rosemary
Baxter Janet
NEC Corporation
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