Method and apparatus for forming a deposited film using a microw

Details Method and apparatus for forming a deposited film using a microw Method and apparatus for forming a deposited film using a microw

1997-04-18

2000-08-01

Dang, Thi

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118723MW, 118723MR, H05H 100, C23C 1600

Patent

active

060963891

ABSTRACT:
A method for continuously forming a functional deposited film of large area with a microwave plasma-assisted CVD method, characterized by including:

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