Method of forming resist pattern in a multilayer resist

Details Method of forming resist pattern in a multilayer resist Method of forming resist pattern in a multilayer resist

1992-09-02

1995-04-18

Chapman, Mark A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 5, 430325, 430967, G03C 1492

Patent

active

054077826

ABSTRACT:
A multilayer photoresist includes an X-ray photoresist layer photosensitibe to X rays formed on a substrate, and a photoresist layer containing an X-ray absorbing agent formed on the X-ray photoresist layer. When the multilayer photoresist is selectively exposed to, for example, an I line (one spectrum), and developed, a mask to be used in the subsequent exposure to X rays is formed in the photoresist layer containing the X-ray absorbing agent. The X-ray photoresist layer on the substrate is then exposed to X rays by using the mask formed in the photoresist layer, and is developed, a resist pattern is obtained.

REFERENCES:
patent: 4515876 (1985-05-01), Yoshihara et al.
patent: 4634643 (1987-01-01), Suzuki
E. Cullmann et al., "Experimental results with a scanning stepper for synchrotronbased x-ray lithography," Journal of Vacuum Science and Technology, vol. B6, Nov./Dec. 1988 p. 2132.
A. N. Broers, "Fine-Line Lithography," Microelectronic Materials and Processes, 1989, Chapter 9.
Book of Semi Standards 1986, vol. 5, Semiconductor Equipment and Materials Institute, Inc.
H. Kinoshita et al., "Soft x-ray reduction lithography using multilayer mirrors," Digest of Papers 1991 4th MicroProcess Conference, Jul. 15-18, 1992, Kanazawa, Japan.

Affiliated with

Also associated with

Rating

Method of forming resist pattern in a multilayer resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming resist pattern in a multilayer resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming resist pattern in a multilayer resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-66009