Photopolymerizable composition and dry PS plate

Details Photopolymerizable composition and dry PS plate Photopolymerizable composition and dry PS plate

1991-12-23

1994-08-02

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430272, 430281, 430303, 522117, 522173, G03F 7027

Patent

active

053344863

ABSTRACT:
A photopolymerizable composition comprising: (a) a compound obtained by reacting one mole of a polyamine represented by the following general formula (I) with at least 2 moles of a compound having a group capable of reacting with the polyamine and a polymerizable ethylenically unsaturated group: ##STR1## wherein n is an integer of not less than 1 and (b) a photopolymerization initiator.
A dry PS plate comprises a substrate provided thereon with, in order, a light-sensitive resin layer and a silicone rubber layer wherein the light-sensitive resin layer comprises the photopolymerizable composition and a polymeric compound having film-forming ability.
The photopolymerizable composition and the dry PS plate have very high sensitivity.

REFERENCES:
patent: 3894873 (1975-07-01), Kobayashi et al.
patent: 4086093 (1978-04-01), Ezumi et al.
patent: 5061598 (1991-10-01), Abe et al.
Chemical Abstracts, Chemistry of Synthethic High Polymers, Jun. 1, 1987, vol. 106, No. 22, p. 681, No. 186528p (JP 61,175,636).
Chemical Abstracts, Chemistry of Synthetic High Polymers, Mar. 25, 1985, vol. 102, No. 12, p. 513, No. 103633n (JP 59,154,443).

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