Microwave energized process for the preparation of high quality

Details Microwave energized process for the preparation of high quality Microwave energized process for the preparation of high quality

1993-01-28

1994-08-02

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427578, 427579, 437235, 437238, B05D 306

Patent

active

053344235

ABSTRACT:
High quality semiconductor material is deposited in a microwave energized glow discharge deposition process by energizing a process gas with microwave energy at a power level sufficient to generate a plasma at or near the 100% saturation mode and by impeding access of deposition species to the substrate so as to lower the deposition rate to a value less than that otherwise achieved operating at the 100% saturation mode.

REFERENCES:
patent: 4504518 (1985-03-01), Ovshinsky et al.
patent: 4517223 (1985-05-01), Ovskinsky et al.
patent: 4721663 (1988-01-01), Johncock et al.
patent: 4883686 (1989-11-01), Doehler et al.
patent: 5192717 (1993-03-01), Kawakami

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