Methods for fabricating electro-optically active niobium dioxide

Details Methods for fabricating electro-optically active niobium dioxide Methods for fabricating electro-optically active niobium dioxide

1987-08-19

1989-10-31

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419226, C23C 1408, C23C 1446

Patent

active

048775045

ABSTRACT:
A reactive ion-beam sputtering technique for fabricating NbO.sub.2 crystalline thin films suitable for use in these electro-optic devices.

REFERENCES:
patent: 3962062 (1976-06-01), Ingrey
J. C. Lee et al., J. Appl. Phys., vol. 56, pp. 3350-3352, (1984).
J. L. Vossen et al., "Thin Film Processes", Academic Press, New York, (1978), pp. 195-198.
A. Grill, Vacuum, vol. 33, pp. 329-332, (1983).
G. C. Vezzoli, J. Appl. Phys., vol. 50, pp. 6390-6395, (1979).

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