Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-11-04
1990-05-15
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430287, 430288, 430325, 522115, 522171, 528168, 528399, G03C 170, C07F 965, C08F 248
Patent
active
049257722
ABSTRACT:
A cover layer for micro-electronic components and VLSI circuits is provided for protecting the components and circuits against alpha radiation. The cover layer is produced by ultraviolet cross linking of a negative resist, wherein, as a constituent for absorbing the alpha rays, the negative resist contains a substituted triphosphazene of the formula (I) whose organic radicals are bonded to phosphorus via oxygen and wherein, on a statistical average, 1 through 3 radicals have cross-linkable, light-sensitive groups. The cover layer provided good protection from alpha rays, has low shrinkage during curing and, given high thermal resistance, can be combined when mixing with other negative resists. ##STR1##
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V. V. Kireev et al., "Oligomeric Alkoxyphosphazens", Russian Chemical Reviews, vol. 50 (1981), Dec., No. 12, pp. 1186-1200.
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Budde Klaus
Nuyken Oskar
Quella Ferdinand
Suefke Thomas
Michl Paul R.
Rodee Christopher D.
Siemens Aktiengesellschaft
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