Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1989-01-04
1991-03-26
Laroche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511171, 31511181, 31323131, 376123, H01J 724
Patent
active
050032259
ABSTRACT:
A method and apparatus are disclosed for producing microwave radiation wherein a generally stable, high-beta, relativistic electron plasma is formed in a static magnetic field of a suitable enclosure either by an external microwave source or in situ within the plasma by means of at least one pair of steady-state interacting energetic electron beams, a convectively unstable wave then being created in the confined plasma either internally in an oscillator mode or externally in an amplifier mode by means of an external launcher for producing a pulse of relatively intense microwave radiation at a frequency near a local electron gyrofrequency. The above steps or functions are preferably sequentially repeated with sequential pulses of microwave radiation being withdrawn from the enclosure, focused by quasi-optical means and directed toward a target including electronic circuitry, so that the beam of sequential pulses is coupled into the electronic circuitry for developing substantial amounts of energy therein.
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Applied Microwave Plasma Concepts, Inc.
Bucher John A.
Ham Seung
Hill Robert C.
LaRoche Eugene R.
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