Method for reducing the surface reflectance of a metal layer dur

Details Method for reducing the surface reflectance of a metal layer dur Method for reducing the surface reflectance of a metal layer dur

1988-11-03

1990-06-12

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437288, 437190, 437192, 437229, 148DIG138, 148DIG158, 430278, 430526, H01L 21302

Patent

active

049333046

ABSTRACT:
The method for producing the surface reflectance of the metal layer during semiconductor processing includes the step of roughening the surface of a metal layer prior to forming the photoresist thereon. The roughened surface reduces reflections that can cause metal notching effects. The step of roughening the surface includes depositing a layer (34) of aluminum which is substantially thinner than the thickness of the primary metal layer by a sputtering process.

REFERENCES:
patent: 4680250 (1987-07-01), Kitamura et al.
patent: 4714668 (1987-12-01), Uneno et al.
patent: 4820611 (1989-04-01), Arnold, III et al.

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