Vapor deposition apparatus

Details Vapor deposition apparatus Vapor deposition apparatus

1988-04-13

1991-03-26

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118730, C23C 1600

Patent

active

050020110

ABSTRACT:
A vapor deposition apparatus for forming thin films on substrates with reactive gases, by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprises a hollow susceptor carrier rotatably disposed inside the reactor vessel, susceptors rotatably disposed on the susceptor carrier to hold the substrates respectively, a driving motor for rotating the susceptor carrier such that the substrates held by the susceptors are revolved with respect to the reactor vessel, and a converting mechanism for converting a rotating motion of the susceptor carrier rotated by the driving motor into a motion for rotating the susceptors together with the substrates around themselves. The converting mechanism is disposed within the hollow of the susceptor carrier.

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