Stacked capacitor type semiconductor memory device and manufactu

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257534, H01L 2968, H01L 2978, H01L 2702

Patent

active

054593441

ABSTRACT:
A semiconductor memory device according to the present invention comprises a memory cell having one transistor and one stacked capacitor. The stacked capacitor is stacked on the surface of a semiconductor substrate. Further, the stacked capacitor has a structure extending on a gate electrode and a word line through an insulating layer. A lower electrode layer of the capacitor has various concave/convex shapes, i.e. step portions and projecting portions formed on the surface thereof. These shapes are made by employing various etching processes. The lower electrode layer has such various concave/convex shapes formed thereon, so that a surface area and capacitance of the capacitor can be increased.

REFERENCES:
patent: 4151607 (1979-04-01), Koyanagi et al.
patent: 4742018 (1988-05-01), Kimura et al.
patent: 4953126 (1990-08-01), Ema
patent: 4958318 (1990-09-01), Harai

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