Blazed diffraction grating structures and method of manufacturin

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156212, 156280, 156285, 156647, 1566591, 156662, 35016221, G02B 518

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044054050

ABSTRACT:
In a diffraction grating made of a single crystalline silicon substrate, one major plane thereof is provided with a plurality of asymmetric triangular grooves, each having a wall inclined by an angle .theta. with respect to the major surface so as to satisfy an equation

REFERENCES:
patent: 3334959 (1967-08-01), Stauton
patent: 3443243 (1969-05-01), Patel
patent: 3654012 (1972-04-01), Schlager
patent: 3697369 (1972-10-01), Amberg et al.
patent: 4357204 (1982-11-01), Jungkman
Muller, "Ultrafast . . . Photodiodes", International Electron Devices Meeting. Wash., D.C., (1976), pp. 420-423.
Blakely, "Method . . . Materials", Applied Physics Letters, vol. 11, No. 11, (12/67), pp. 335-336.
Tsang et al., "Preferentially . . . Silicon", Journal of Applied Physics, vol. 46, No. 5, (5/75), pp. 2163-2166.
Bassous, "Fabrication of . . . Silicon", IEEE Transaction on Electron Devices, vol. 25, No. 10, (10/78), pp. 1178-1185.
Wang et al., "Preferential . . . GaAs", Optics Letters, vol. 4, No. 3, (3/79), pp. 96-98.

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