Resist compositions

Details Resist compositions Resist compositions

1994-01-19

1994-10-04

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522150, 522160, G03C 1492

Patent

active

053525647

ABSTRACT:
A resist composition comprising a base resin, an acid release agent, and a dissolution inhibitor is improved in sensitivity and resolution when the base resin is typically selected from poly-t-butoxystyrene/poly-hydroxystyrene, poly-t-butoxystyrene/poly-p-methoxymethoxystyrene/polyhydroxystyrene, and poly-t-butoxystyrene/poly-p-methoxystyrene/polyhydroxystyrene copolymers. The composition forms a resist useful for the manufacture of LSI.

REFERENCES:
patent: 4603101 (1986-07-01), Cridello
patent: 5128231 (1992-07-01), Itoh et al.

Affiliated with

Also associated with

Rating

Resist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-580631