Plasma treating apparatus for gas temperature measuring method

Details Plasma treating apparatus for gas temperature measuring method Plasma treating apparatus for gas temperature measuring method

1989-02-13

1989-11-28

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156627, 156643, 156646, 118712, 118 501, 118725, 118620, 20419213, 20419233, 204298, 427 8, 427 38, B44C 122, B05D 306, C23C 1600, C23C 1400

Patent

active

048835609

ABSTRACT:
Nitrogen gas plasma emission intensities are theoretically calculated at various gas temperatures, while they are actually measured by a spectroscope. By comparing the waveforms of the calculated and measured emission intensities with each other, the nitrogen gas temperature of at an arbitrary point in a plasma treating room can be determined.

REFERENCES:
patent: 4115184 (1978-09-01), Poulsen
patent: 4415402 (1983-11-01), Gelernt et al.
patent: 4430151 (1984-02-01), Tsukada
patent: 4579623 (1986-04-01), Suzuki et al.
patent: 4609426 (1986-09-01), Ogawa et al.

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