Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1999-08-11
2000-08-22
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
510176, G03F 732
Patent
active
061070092
ABSTRACT:
An aqueous photolithographic resist developer composition including a metal alkali, a dialkylalkanolamine adjuvant, a surfactant, and a buffer increases the speed of novolak resin-based resists exposed to high energy radiation to permit high resolution photolithographic patterning of the resist. A multi-cycle process, in combination with the developer composition of this invention, enables resist resolution capabilities of less than 0.20 .mu.m, with contrast >5, and dark loss less than 10%.
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